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Lab Facilities
- Thin Film Materials Synthesis
PLD chamber for oxide growth, equipped with RHEED and in-situ Auger Spectroscopy
Excimer laser source and PLD chamber for oxides
PLD chamber for sulfides
AJA Sputtering system with DC and RF guns
Tube furnace for oxide substrate annealing (O2) and device contact annealing (N2)
Wet bench for substrate preparation (HF)
- Bulk Materials (Powder and Single Crystal) Synthesis
Sliding tube furnace
Two zone tube furnace
Single zone tube furnace
CS2 annealing furnace for sulfide synthesis
Box furnace (1700˚C) for oxide pellets sintering
Quartz tube sealing station
Glovebox
24T laboratory press
100T CIP (cold isostatic) press
- Device Fabrication and Transport Measurements
Spinner and hot plates
JANIS closed-cycle cryostat (10-800K) with coaxial cabling and optical access
Probe Station
Electronics for transport measurements
Piezoelectric-based strain stage
